Physical and bonding characteristics of N-doped hydrogenated amorphous silicon carbide films grown by PECVD and annealed by pulsed electron beam

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ژورنال

عنوان ژورنال: Journal of Physics: Conference Series

سال: 2007

ISSN: 1742-6588,1742-6596

DOI: 10.1088/1742-6596/61/1/086